Direct-Write Ion Beam Lithography

Review Article Direct-Write Ion Beam Lithography

Patterning with a focused ion beam (FIB) is an extremely versatile fabrication process that can be used to create microscale and nanoscale designs on the surface of practically any solid sample material. Based on the type of ion-sample interaction utilized, FIBbasedmanufacturing can be both subtractive and additive, even in the same processing step. Indeed, the capability of easily creating thr...

Focused Ion Beam Lithography

Three-dimensional direct-write lithography into photopolymer.

We demonstrate a three-dimensional direct-write lithography system capable of writing deeply buried, localized index structures into diffusion-mediated photopolymer. The system is similar to that used for femtosecond writing in glass, but has a number of advantages including greater flexibility in the writing media and the ability to use low power, inexpensive, continuous-wave lasers. This syst...

Neon Ion Beam Lithography (NIBL).

Existing techniques for electron- and ion-beam lithography, routinely employed for nanoscale device fabrication and mask/mold prototyping, do not simultaneously achieve efficient (low fluence) exposure and high resolution. We report lithography using neon ions with fluence <1 ion/nm(2), ∼1000× more efficient than using 30 keV electrons, and resolution down to 7 nm half-pitch. This combination o...

Lossless Layout Image Compression Algorithms for Electron-Beam Direct-Write Lithography

Electron-beam direct-write (EBDW) lithography systems must in the future transmit terabits of information per second to be viable for commercial semiconductor manufacturing. Lossless layout image compression algorithms with high decoding throughputs and modest decoding resources are tools to address the data transfer portion of the throughput problem. The earlier lossless layout image compressi...